On direct-current magnetron sputtering at industrial conditions with high ionization fraction of sputtered species
Jaroslav Hnilica, Peter Klein, M. Učík, Stanislava Debnárová, J. Klusoň, Petr Vašina
Topics & Concepts
High-power impulse magnetron sputteringSputter depositionSputteringPlasmaMaterials scienceCavity magnetronDirect currentIonizationDeposition (geology)OptoelectronicsEngineering physicsIonAnalytical Chemistry (journal)Thin filmVoltageElectrical engineeringChemistryNanotechnologyPhysicsEngineeringSedimentChromatographyQuantum mechanicsPaleontologyOrganic chemistryBiologyMetal and Thin Film MechanicsIon-surface interactions and analysisFusion materials and technologies