Effect of process parameters on oxidation-enhanced removal mechanisms of GaN in photoelectrochemical mechanical polishing
Yuewen Sun, Yueqin Wu, Shang Gao, Yang Zhao, Renke Kang, Zhigang Dong
Topics & Concepts
PolishingProcess (computing)Materials scienceChemical-mechanical planarizationOxidation processPhotoelectrochemistryOptoelectronicsMetallurgyComputer scienceElectrochemistryChemical engineeringChemistryEngineeringElectrodePhysical chemistryOperating systemAdvanced Surface Polishing TechniquesSemiconductor materials and devicesIntegrated Circuits and Semiconductor Failure Analysis