Highly hydroxylated hafnium clusters are accessible to high resolution EUV photoresists under small energy doses
Yu‐Fang Tseng, Pin-Chia Liao, Po-Hsiung Chen, Tsai-Sheng Gau, Burn-Jeng Lin, Po‐Wen Chiu, Jui-Hsiung Liu
Abstract
This work reports the success in accessing high-resolution negative-tone EUV photoresists without radical chain growth in the aggregation mechanism.
Topics & Concepts
Extreme ultraviolet lithographyPhotoresistCarboxylateCluster (spacecraft)ChemistryResolution (logic)High resolutionMaterials scienceOptoelectronicsStereochemistryOrganic chemistryComputer scienceGeologyArtificial intelligenceRemote sensingLayer (electronics)Programming languageAdvancements in Photolithography TechniquesElectron and X-Ray Spectroscopy TechniquesIntegrated Circuits and Semiconductor Failure Analysis