Litcius/Paper detail

Sub-10 nm patterning of few-layer MoS2 and MoSe2 nanolectronic devices by oxidation scanning probe lithography

Yu Kyoung Ryu, Arancha I. Dago, Yang He, Francisco M. Espinosa, Elena López-Elvira, Carmen Munuera, Ricardo Garcı́a

2020Applied Surface Science32 citationsDOI

Topics & Concepts

LithographyMaterials scienceNanotechnologyNanoscopic scaleLayer (electronics)TransistorEtching (microfabrication)OxidePlasma etchingOptoelectronicsPhotolithographyPlasmaNano-NanolithographyResistMultiple patterningFabricationComposite materialElectrical engineeringMetallurgyPathologyQuantum mechanicsPhysicsAlternative medicineEngineeringVoltageMedicine2D Materials and ApplicationsNanowire Synthesis and ApplicationsMolecular Junctions and Nanostructures
Sub-10 nm patterning of few-layer MoS2 and MoSe2 nanolectronic devices by oxidation scanning probe lithography | Litcius