XPS depth profiling of functional materials: applications of ion beam etching techniques
Dongying Li, Yangfei Chen, Chuanqiang Zhou, Changrui Shi, Zhiqiang Xu, Zhengjie Miao, Zheng Xi, Jie Han
Abstract
X-ray photoelectron spectroscopy depth profiling combined with ion beam etching methods is a primary tool to study the chemical composition of functional materials at different scales from the surface to the bulk.
Topics & Concepts
X-ray photoelectron spectroscopyIon beamSputteringMaterials scienceEtching (microfabrication)Isotropic etchingIonProfiling (computer programming)NanotechnologyAnalytical Chemistry (journal)Thin filmChemistryChemical engineeringComputer scienceEnvironmental chemistryEngineeringLayer (electronics)Organic chemistryOperating systemIon-surface interactions and analysisElectron and X-Ray Spectroscopy TechniquesSemiconductor materials and devices