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Investigation of abnormally high growth-per-cycle in atomic layer deposition of Al2O3 using trimethylaluminum and water

So‐Yeon Ham, Zhenyu Jin, Seokhee Shin, Minseo Kim, Mingyu Seo, Yo‐Sep Min

2021Applied Surface Science17 citationsDOI

Topics & Concepts

Atomic layer depositionChemistryLimitingSaturation (graph theory)Analytical Chemistry (journal)Chemical engineeringLayer (electronics)Organic chemistryEngineeringMechanical engineeringMathematicsCombinatoricsSemiconductor materials and devicesElectronic and Structural Properties of OxidesCatalytic Processes in Materials Science
Investigation of abnormally high growth-per-cycle in atomic layer deposition of Al2O3 using trimethylaluminum and water | Litcius