Characteristics of (Mo-Ta-W)-C and (Nb-Ta-W)-C refractory multi-principal element carbide thin films by non-reactive direct current magnetron co-sputtering
Yiyong Zhang, Bin Zhang, Zhiyuan Jing, Haoxu Wang, Wen Bin Yao, Xiubing Liang
Topics & Concepts
Materials scienceThin filmCarbideAmorphous solidSputter depositionTantalumCarbon filmAmorphous carbonSputteringMetalAnalytical Chemistry (journal)CrystallographyMetallurgyNanotechnologyChemistryOrganic chemistryMetal and Thin Film MechanicsAdvanced materials and compositesDiamond and Carbon-based Materials Research