Elimination of threading dislocations in<i>α</i>-Ga<sub>2</sub>O<sub>3</sub>by double-layered epitaxial lateral overgrowth
Katsuaki Kawara, Yuichi Oshima, Mitsuru Okigawa, Takashi Shinohe
Abstract
We demonstrated double-layered epitaxial lateral overgrowth of α-Ga2O3 by halide vapor phase epitaxy. The second ELO α-Ga2O3 were regrown epitaxially and selectively through the windows of the patterned masks which were prepared on an ELO α-Ga2O3. The ELO islands coalesced step-by-step due to the nested-structure mask pattern. No threading dislocation was found by TEM not only above the masks but also above the windows of the second ELO pattern. The dislocation density was estimated to be less than 5 × 106 cm−2. We obtained a continuous crystalline α-Ga2O3 with a low density of dislocations in the entire second-ELO surface.
Topics & Concepts
EpitaxyDislocationThreading (protein sequence)Materials scienceVapor phaseCrystallographyOptoelectronicsOpticsLayer (electronics)ChemistryNanotechnologyComposite materialPhysicsThermodynamicsProtein structureBiochemistryGa2O3 and related materialsZnO doping and propertiesAdvanced Photocatalysis Techniques