Effect of plasma power on properties of hydrogenated amorphous silicon carbide hardmask films deposited by PECVD
Sungyool Kwon, Yoon‐Soo Park, Wonjin Ban, Chulmin Youn, Sung‐Woo Lee, Jaeyoung Yang, D. E. Jung, Taekjib Choi
Topics & Concepts
Plasma-enhanced chemical vapor depositionMaterials scienceSilicon carbidePlasmaAmorphous solidAmorphous siliconRefractive indexCarbideChemical vapor depositionComposite materialElastic modulusChemical engineeringOptoelectronicsCrystalline siliconLayer (electronics)ChemistryCrystallographyQuantum mechanicsPhysicsEngineeringDiamond and Carbon-based Materials ResearchMetal and Thin Film MechanicsSemiconductor materials and devices