Enhancement of the Plant Grafting Technique with Dielectric Barrier Discharge Cold Atmospheric Plasma and Plasma-Treated Solution
Е. М. Кончеков, Л. В. Колик, Yury K. Danilejko, S. V. Belov, К. В. Артемьев, Maxim E. Astashev, Tatyana Pavlik, V. Lukanin, Alexey Kutyrev, Igor Smirnov, Sergey V. Gudkov
Abstract
A garden plant grafting technique enhanced by cold plasma (CAP) and plasma-treated solutions (PTS) is described for the first time. It has been shown that CAP created by a dielectric barrier discharge (DBD) and PTS makes it possible to increase the growth of Pyrus communis L. by 35–44%, and the diameter of the root collar by 10–28%. In this case, the electrical resistivity of the graft decreased by 20–48%, which indicated the formation of a more developed vascular system at the rootstock–scion interface. The characteristics of DBD CAP and PTS are described in detail.
Topics & Concepts
RootstockGraftingDielectric barrier dischargePlasmaDielectricMaterials scienceElectrical resistivity and conductivityChemistryAnalytical Chemistry (journal)HorticultureComposite materialChromatographyOptoelectronicsElectrical engineeringBiologyEngineeringPhysicsPolymerQuantum mechanicsPlasma Applications and DiagnosticsLight effects on plantsElectrohydrodynamics and Fluid Dynamics