Chemical Vapor Deposition of Highly Conjugated, Transparent Boron Carbon Nitride Thin Films
Paolo Giusto, Daniel Cruz, Tobias Heil, Nadezda V. Tarakina, M. Patrini, Markus Antonietti
Abstract
Abstract Ternary materials made up only from the lightweight elements boron, carbon, and nitrogen are very attractive due to their tunable properties that can be obtained by changing the relative elemental composition. However, most of the times, the synthesis requires to use up to three different precursor and very high temperatures for the synthesis. Moreover, the low reciprocal solubility of boron nitride and graphene often leads to BN‐C composite materials due to phase segregation. Herein, an innovative method is presented to prepare BCN thin films by chemical vapor deposition from a single source precursor, melamine diborate. The deposition occurs homogenously at relatively low temperatures generating very high degree of sp 2 conjugation. The as‐prepared thin films possess high transparency and refractive index values in the visible range that are of interest for reflective mirrors and lenses. Furthermore, they are wide‐bandgap semiconductor with very positive valence band, making these materials very stable against oxidation of interest as protective coating and charge transport layer for solar cells. The simple chemical vapor deposition method that relies on commonly available and low‐hazard precursor can open the way for application of BCN thin films in optics, optoelectronics, and beyond.