Influence of nitrogen concentration on electrical, mechanical, and structural properties of tantalum nitride thin films prepared via DC magnetron sputtering
Davoud Dastan, Ke Shan, Azadeh Jafari, Farzan Gity, Xi-Tao Yin, Zhicheng Shi, Najlaa D. Alharbi, Bilal Ahmad Reshi, Wenbin Fu, Ştefan Ţălu, Loai Aljerf, Hamid Garmestani, Lida Ansari
Topics & Concepts
Tantalum nitrideTantalumMaterials scienceThin filmNitrideCrystalliteAnalytical Chemistry (journal)Grain sizeSputter depositionSputteringGrain boundaryComposite materialMetallurgyNanotechnologyMicrostructureChemistryLayer (electronics)ChromatographyMetal and Thin Film MechanicsGaN-based semiconductor devices and materialsSemiconductor materials and devices