A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films
Nils Boysen, Bujamin Misimi, Arbresha Muriqi, Jan‐Lucas Wree, Tim Hasselmann, Detlef Rogalla, Tobias Haeger, D. Theirich, Michael Nolan, Thomas Riedl, Anjana Devi
Abstract
NHC)(hmds)] revealed interesting similarities and notable differences in precursor chemistry and growth characteristics. This first report of APP-ALD grown copper layers is an important starting point for high throughput, low-cost manufacturing of copper films for nano- and optoelectronic devices.
Topics & Concepts
Atomic layer depositionCarbeneCopperThin filmLayer (electronics)Deposition (geology)MetalPlasmaMaterials scienceChemical engineeringChemistryNanotechnologyOrganic chemistryCatalysisPaleontologyBiologyQuantum mechanicsPhysicsEngineeringSedimentSemiconductor materials and devicesCopper Interconnects and ReliabilitySurface and Thin Film Phenomena