Influence of O2 Flow Rate on the Properties of Ga2O3 Growth by RF Magnetron Sputtering
Dengyue Li, Hehui Sun, Tong Liu, Hongyan Jin, Zhenghao Li, Yaxin Liu, Donghao Liu, Dongbo Wang
Abstract
The influence of the O2 flow rate on the properties of gallium oxide (Ga2O3) by RF magnetron sputtering was studied. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), transmittance spectra, and photoluminescence (PL) spectra have been employed to study the Ga2O3 thin films. With the increase in oxygen flow rate, both the crystal quality and luminescence intensity of the Ga2O3 samples first decrease and then enhance. All these observations suggested that the reduction in the oxygen defect density is responsible for the improvement in the crystal quality and emission intensity of the material. Our results demonstrated that high-quality Ga2O3 materials could be obtained by adjusting the oxygen flow rate.