Reduced leakage current in atomic-layer-deposited HfO2 thin films deposited at low temperature by in-situ defect passivation
Suyeon Kim, Seunghun Lee, In Ho Jo, Tae Joo Park, Jeong Hwan Kim, Jeong Hwan Kim
Topics & Concepts
Atomic layer depositionPassivationOxygenMaterials scienceImpurityLeakage (economics)Analytical Chemistry (journal)Thin filmLayer (electronics)NanotechnologyChemical engineeringChemistryOrganic chemistryEngineeringEconomicsMacroeconomicsSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignFerroelectric and Negative Capacitance Devices