Impact of layer thickness on the operating characteristics of In2O3/ZnO heterojunction thin-film transistors
Wejdan S. AlGhamdi, Aiman Fakieh, Hendrik Faber, Yen‐Hung Lin, Wei‐Zhi Lin, Po‐Yu Lu, Chien‐Hao Liu, K. Saláma, Thomas D. Anthopoulos
Abstract
Combining low-dimensional layers of dissimilar metal oxide materials to form a heterojunction structure offers a potent strategy to improve the performance and stability of thin-film transistors (TFTs). Here, we study the impact of channel layer thicknesses on the operating characteristics of In2O3/ZnO heterojunction TFTs prepared via sputtering. The conduction band offset present at the In2O3/ZnO heterointerface affects the device's operating characteristics, as is the thickness of the individual oxide layers. The latter is investigated using a variety of experimental and computational modeling techniques. An average field-effect mobility (μFE) of >50 cm2 V−1 s−1, accompanied by a low threshold voltage and a high on/off ratio (∼108), is achieved using an optimal channel configuration. The high μFE in these TFTs is found to correlate with the presence of a quasi-two-dimensional electron gas at the In2O3/ZnO interface. This work provides important insight into the operating principles of heterojunction metal oxide TFTs, which can aid further developments.