Effect of oxygen flow rate ratio on crystalline phase and properties of copper oxide films prepared by room-temperature high-power impulse magnetron sputtering
Ming-Jie Zhao, Jie Huang, Jin-Fa Zhang, Chia‐Hsun Hsu, Wan-Yu Wu, Pao-Hsun Huang, Sufen Wei, Shui‐Yang Lien, Wen‐Zhang Zhu
Topics & Concepts
Materials scienceAnalytical Chemistry (journal)Volumetric flow rateSputteringHigh-power impulse magnetron sputteringOxygenX-ray photoelectron spectroscopySputter depositionOxideStoichiometryCopper oxideThin filmMetallurgyNanotechnologyChemistryChemical engineeringThermodynamicsPhysical chemistryPhysicsEngineeringOrganic chemistryChromatographyCopper-based nanomaterials and applicationsZnO doping and propertiesElectronic and Structural Properties of Oxides