Laser-based defect characterization and removal process for manufacturing fused silica optic with high ultraviolet laser damage threshold
Xiaocong Peng, Xin Cheng, Chaoyang Wei, Songlin Wan, Kaizao Ni, Zhenqi Niu, Yichi Han, Zhigang Jiang, Zhen Cao, Jianda Shao
Abstract
Residual processing defects during the contact processing processes greatly reduce the anti-ultraviolet (UV) laser damage performance of fused silica optics, which significantly limited development of high-energy laser systems. In this study, we demonstrate the manufacturing of fused silica optics with a high damage threshold using a CO2 laser process chain. Based on theoretical and experimental studies, the proposed uniform layer-by-layer laser ablation technique can be used to characterize the subsurface mechanical damage in three-dimensional full aperture. Longitudinal ablation resolutions ranging from nanometers to micrometers can be realized; the minimum longitudinal resolution is < 5 nm. This technique can also be used as a crack-free grinding tool to completely remove subsurface mechanical damage, and as a cleaning tool to effectively clean surface/subsurface contamination. Through effective control of defects in the entire chain, the laser-induced damage thresholds of samples fabricated by the CO2 laser process chain were 41% (0% probability) and 65.7% (100% probability) higher than those of samples fabricated using the conventional process chain. This laser-based defect characterization and removal process provides a new tool to guide optimization of the conventional finishing process and represents a new direction for fabrication of highly damage-resistant fused silica optics for high-energy laser applications.