An efficient chemistry-enhanced CFD model for the investigation of the rate-limiting mechanisms in industrial Chemical Vapor Deposition reactors
Paris Papavasileiou, Eleni D. Koronaki, Gabriele Pozzetti, M. Kathrein, Christoph Czettl, Andreas G. Boudouvis, T. J. Mountziaris, Stéphane Bordas
Topics & Concepts
Computational fluid dynamicsDeposition (geology)DiffusionReaction rateChemical kineticsChemistryDamköhler numbersKineticsReaction mechanismReaction rate constantLimitingMechanicsChemical vapor depositionProcess (computing)ThermodynamicsChemical reactionChemical engineeringCatalysisPhysical chemistryMechanical engineeringComputer sciencePhysicsCombustionEngineeringOrganic chemistryQuantum mechanicsBiologyOperating systemPaleontologySedimentParticle Dynamics in Fluid FlowsCatalytic Processes in Materials ScienceAerosol Filtration and Electrostatic Precipitation