Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks
Min Tu, Benzheng Xia, Dmitry E. Kravchenko, Max L. Tietze, Alexander John Cruz, Ivo Stassen, Tom Hauffman, Joan Teyssandier, Steven De Feyter, Zheng Wang, Roland A. Fischer, Benedetta Marmiroli, Heinz Amenitsch, Ana Torvisco, Miriam de J. Velásquez‐Hernández, Paolo Falcaro, Rob Ameloot
Topics & Concepts
Materials scienceNanotechnologyElectron-beam lithographyResistLithographyNanolithographyStencil lithographyPorosityNext-generation lithographyX-ray lithographyMesoporous materialPhotolithographyOptoelectronicsChemistryFabricationComposite materialLayer (electronics)MedicineAlternative medicinePathologyCatalysisBiochemistryMetal-Organic Frameworks: Synthesis and ApplicationsCopper Interconnects and ReliabilityCorrosion Behavior and Inhibition