Silane‐Mediated Expansion of Domains in Si‐Doped κ‐Ga<sub>2</sub>O<sub>3</sub> Epitaxy and its Impact on the In‐Plane Electronic Conduction
Piero Mazzolini, Zsolt Fogarassy, A. Parisini, Francesco Mezzadri, David R. Diercks, Matteo Bosi, L. Seravalli, A. Sacchi, Giulia Spaggiari, Danilo Bersani, Oliver Bierwagen, Benjamin M. Janzen, Marcella Naomi Marggraf, Markus R. Wagner, Ildikó Cora, B. Pécz, Abbès Tahraoui, A. Bosio, Carmine Borelli, Stefano Leone, R. Fornari
Abstract
Abstract Unintentionally doped (001)‐oriented orthorhombic κ‐Ga 2 O 3 epitaxial films on c‐plane sapphire substrates are characterized by the presence of ≈ 10 nm wide columnar rotational domains that can severely inhibit in‐plane electronic conduction. Comparing the in‐ and out‐of‐plane resistance on well‐defined sample geometries, it is experimentally proved that the in‐plane resistivity is at least ten times higher than the out‐of‐plane one. The introduction of silane during metal‐organic vapor phase epitaxial growth not only allows for n ‐type Si extrinsic doping, but also results in the increase of more than one order of magnitude in the domain size (up to ≈ 300 nm) and mobility (highest µ ≈ 10 cm 2 V −1 s −1 , with corresponding lowest ρ ≈ 0.2 Ωcm). To qualitatively compare the mean domain dimension in κ‐Ga 2 O 3 epitaxial films, non‐destructive experimental procedures are provided based on X‐ray diffraction and Raman spectroscopy. The results of this study pave the way to significantly improved in‐plane conduction in κ‐Ga 2 O 3 and its possible breakthrough in new generation electronics. The set of cross‐linked experimental techniques and corresponding interpretation here proposed can apply to a wide range of material systems that suffer/benefit from domain‐related functional properties.