Structural and chemical properties of NiO<sub><i>x</i></sub> thin films: the role of oxygen vacancies in NiOOH formation in a H<sub>2</sub>O atmosphere
Raoul Blume, Wolfram Calvet, A. Ghafari, Thomas Mayer, Axel Knop‐Gericke, Robert Schlögl
Abstract
Formation of Ni-(oxy)-hydroxides on NiO x thin films in H 2 O vapor is studied by combined in situ XPS/XAS, SEM and DFT. Formation is mediated by structural defects and oxygen vacancies at high temperatures instigating H 2 O dissociation and metastable OH chemisorption.
Topics & Concepts
Non-blocking I/OOxygenX-ray photoelectron spectroscopyFermi levelThin filmMaterials scienceDissociation (chemistry)Analytical Chemistry (journal)ChemistryNanotechnologyPhysical chemistryChemical engineeringElectronCatalysisBiochemistryPhysicsChromatographyQuantum mechanicsOrganic chemistryEngineeringZnO doping and propertiesTransition Metal Oxide NanomaterialsCopper-based nanomaterials and applications