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Temperature Gradient ZnO Deposited via ALD for High-Performance Transistor Applications

Bowen Che, Hao Zhang, Jun Yang, Jie Qi, Xingwei Ding, Jianhua Zhang

2020IEEE Journal of the Electron Devices Society10 citationsDOIOpen Access PDF

Abstract

This work reports an alternative atomic layer deposition (ALD) method to fabricate ZnO thin-film transistors (TFTs). The ZnO film is deposited with temperature naturally-cooling process from 200 to 100°C, called a “temperature gradient ZnO (TG-ZnO)”). After optimized annealing treatment at 300°C, the TG-ZnO TFT shows an excellent performance compared to those fabricated with traditional constant temperature deposition, including a high saturation mobility <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\left(\mu_{\text {sat }}\right)$ </tex-math></inline-formula> of 11.8 cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> /Vs, which is 5 times higher than the ZnO TFT, a good on/off-state current ratio <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\left(I_{\mathrm{on}} / I_{\mathrm{off}}\right)$ </tex-math></inline-formula> of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.9 \times 10^{7}$ </tex-math></inline-formula> , a small subthreshold swing ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$SS$ </tex-math></inline-formula> ) of 175 mV/decade and a threshold voltage <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\left(V_{\mathrm{th}}\right)$ </tex-math></inline-formula> of 1.1 V. Meanwhile, the TG-ZnO TFT has better crystallization than 100°C-ZnO and lower oxygen vacancies than 200°C-ZnO. These characters enable the TG-ZnO TFT not only to maintain a high mobility, but also to present a satisfactory <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$I_{\mathrm{on}} / I_{\mathrm{off}}$ </tex-math></inline-formula> ratio. This promising deposition technique provides a new idea for fabricating TFTs with high mobility.

Topics & Concepts

Materials scienceAtomic layer depositionOptoelectronicsTransistorWide-bandgap semiconductorElectronic engineeringElectrical engineeringEngineering physicsNanotechnologyPhysicsEngineeringThin filmVoltageThin-Film Transistor TechnologiesZnO doping and propertiesSemiconductor materials and devices
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