Absence of a Crystal Direction Regime in which Sputtering Corresponds to Amorphous Material

Abstract

Erosion of material by energetic ions, i.e., sputtering, is widely used in industry and research. Using experiments and simulations that, independently of each other, obtain the sputter yield of thousands of individual grains, we demonstrate here that the sputter yield for heavy keV ions on metals changes as a continuous function of the crystal direction. Moreover, we show that polycrystalline metals with randomly oriented grains do not sputter with the same yield as the amorphous material. The key reason for this is attributed to linear collision sequences rather than channeling.

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