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Spectroscopic ellipsometry and FTIR characterization of annealed SiOxNy:H films prepared by PECVD

Mohammed Boulesbaa

2021Optical Materials14 citationsDOI

Topics & Concepts

Fourier transform infrared spectroscopyPlasma-enhanced chemical vapor depositionAnalytical Chemistry (journal)EllipsometryMaterials scienceAmorphous solidAnnealing (glass)Silicon oxynitrideInfraredThin filmRefractive indexSiliconInfrared spectroscopyChemistrySilicon nitrideCrystallographyOpticsNanotechnologyOptoelectronicsOrganic chemistryComposite materialPhysicsThin-Film Transistor TechnologiesSilicon Nanostructures and PhotoluminescenceZnO doping and properties
Spectroscopic ellipsometry and FTIR characterization of annealed SiOxNy:H films prepared by PECVD | Litcius