An ultraviolet self-initiated polymerized platform for specific recognition and elimination of caffeic acid based on the molecular imprinting technology
Donglei Fu, Tao Chen, Honglei Liu, Yujun Cheng, Hanwen Zong, Yiheng Zhang, Rongkun Zheng, Jingquan Liu
Topics & Concepts
PolymerizationMolecularly imprinted polymerMolecular imprintingHydrogen peroxidePhotocatalysisDetection limitFluorescenceChemistryPolymerCaffeic acidUltravioletPhotochemistryMaterials scienceCombinatorial chemistryOrganic chemistryChromatographyCatalysisAntioxidantSelectivityOptoelectronicsQuantum mechanicsPhysicsAnalytical chemistry methods developmentCarbon and Quantum Dots ApplicationsAdvanced Nanomaterials in Catalysis