Abrasive-free chemical-mechanical planarization (CMP) of gold for thin film nano-patterning
Raphael Gherman, Guillaume Beaudin, Romain Stricher, Jean‐François Bryche, Pierre L. Lévesque, François Fillion‐Gourdeau, Steve MacLean, Dominique Drouin, Paul G. Charette, Serge Ecoffey
Abstract
were fabricated and the planarization dynamics were monitored over time, leading to the identification of distinct planarization phases and their correlation with the material removal mechanism. Finally, plasmonic cavities of gold nanostructure arrays over a gold mirror were fabricated. The cavities exhibited efficient plasmonic resonance in the visible range, aligning well with simulation results.
Topics & Concepts
Chemical-mechanical planarizationAbrasiveMaterials scienceNano-NanotechnologyThin filmComposite materialMetallurgyLayer (electronics)Advanced Surface Polishing TechniquesNanofabrication and Lithography TechniquesOptical Coatings and Gratings