Selective chemical wet etching of Si1-xGex versus Si in single-layer and multi-layer with HNO3/HF mixtures
Yongjoon Choi, Hyunchul Jang, Dae-seop Byun, Dae‐Hong Ko
Topics & Concepts
Etching (microfabrication)Materials scienceIsotropic etchingLayer (electronics)EpitaxyReactive-ion etchingEtch pit densityDry etchingNanostructureOptoelectronicsAnalytical Chemistry (journal)NanotechnologyChemistryChromatographyNanowire Synthesis and ApplicationsSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit Design