Design of a disulfide bond-containing photoresist with extremely low volume shrinkage and excellent degradation ability for UV-nanoimprinting lithography
Mingliang Zhang, Shengling Jiang, Yanjing Gao, Jun Nie, Fang Sun
Topics & Concepts
PhotoresistMaterials scienceNanoimprint lithographyLithographyPolymerizationResistShrinkagePolymerAcrylateChemical engineeringComposite materialPolymer chemistryOptoelectronicsCopolymerFabricationEngineeringPathologyAlternative medicineMedicineLayer (electronics)Nanofabrication and Lithography TechniquesAdvancements in Photolithography TechniquesNanomaterials and Printing Technologies