Preparation of UV-curable PSAs by grafting isocyanate-terminated photoreactive monomers and the effect of the functionality of grafted monomers on the debonding properties on Si wafers

Abstract

was used, the 180° peel strength of 40% NDPM-grafted PSA decreased to 8.40 gf/25 mm, which was much lower than that of 40% AOI-grafted PSA (39.26 gf/25 mm). NDPM-grafted PSA also showed that its storage modulus shifted more to the upper right side of Chang's viscoelastic window than AOI-grafted PSA, and this is because NDPM provided a higher degree of crosslinking than AOI. Furthermore, SEM-EDS analysis showed that UV-cured NDPM-grafted PSA retained almost no residue on the silicon wafer after debonding.

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