Dependence of optical properties on composition of silicon carbonitride thin films deposited at low temperature by PECVD
G. Lavareda, Y. Vygranenko, A. Amaral, C. Nunes de Carvalho, N.P. Barradas, E. Alves, P. Brogueira
Topics & Concepts
Plasma-enhanced chemical vapor depositionSilaneThin filmSiliconMaterials scienceTernary operationAnalytical Chemistry (journal)Refractive indexStoichiometryChemical vapor depositionChemical compositionBand gapChemistryNanotechnologyPhysical chemistryOrganic chemistryComposite materialOptoelectronicsProgramming languageComputer scienceThin-Film Transistor TechnologiesDiamond and Carbon-based Materials ResearchSemiconductor materials and devices