Litcius/Paper detail

360 GHz f<sub>MAX</sub> Graded-Channel AlGaN/GaN HEMTs for mmW Low-Noise Applications

Jeong‐Sun Moon, Joel Wong, Bob Grabar, M. Antcliffe, Peter Chen, Erdem Arkun, Isaac Khalaf, A. Corrion, James M. Chappell, Nivedhita Venkatesan, Patrick Fay

2020IEEE Electron Device Letters82 citationsDOI

Abstract

We report scaled, graded-channel AlGaN/GaN HEMTs with an extrinsic f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> and f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">MAX</sub> of 170 GHz and 363 GHz, which is the highest in emerging graded-channel GaN HEMTs. At 50-nm gate length, the f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> ·Lg of 8.5 GHz·μm is comparable to that of conventional scaled AlGaN/GaN HEMTs fabricated together. At low DC power, the scaled graded-channel AlGaN/GaN HEMTs show a higher f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">MAX</sub> than the scaled AlGaN/GaN HEMT with the same gate length. The devices also exhibit a 2 dB improvement in gain at low DC bias, and the measured minimum noise figure was as low as 0.5 dB at 30 GHz. This is comparable to state-of-the-art device noise figure from a 20-nm gate length AlGaN/GaN HEMT. The combination of improved f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> , f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">MAX</sub> , and minimum noise figure at low DC power for the graded-channelAlGaN/GaN HEMTs shows great promise for ultra-low-power, low-noise amplifiers.

Topics & Concepts

High-electron-mobility transistorOptoelectronicsNoise (video)PhysicsMaterials scienceElectrical engineeringTopology (electrical circuits)TransistorComputer scienceQuantum mechanicsEngineeringArtificial intelligenceVoltageImage (mathematics)GaN-based semiconductor devices and materialsRadio Frequency Integrated Circuit DesignGa2O3 and related materials