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Selectivity in atomically precise etching: Thermal atomic layer etching of a CoFeB alloy and its protection by MgO

Mahsa Konh, Yang Wang, Hang Chen, Subhash Bhatt, John Q. Xiao, Andrew V. Teplyakov

2021Applied Surface Science13 citationsDOI

Topics & Concepts

Materials scienceEtching (microfabrication)X-ray photoelectron spectroscopyAlloyLayer (electronics)Dry etchingThermal desorptionReactive-ion etchingDesorptionAnalytical Chemistry (journal)NanotechnologyChemical engineeringOptoelectronicsComposite materialAdsorptionChemistryEngineeringChromatographyOrganic chemistrySemiconductor materials and devicesElectronic and Structural Properties of OxidesPlasma Diagnostics and Applications
Selectivity in atomically precise etching: Thermal atomic layer etching of a CoFeB alloy and its protection by MgO | Litcius