Notable difference between rapid-thermal and microwave annealing on Ge pMOSFETs
Dun‐Bao Ruan, Kuei‐Shu Chang‐Liao, Shih-Han Yi, Fu-Yang Chu, Ji-Syuan Li, Chia‐Wei Hsu, Jiayi Huang, Tzung-Yu Wu
Topics & Concepts
Materials scienceAnnealing (glass)OptoelectronicsMicrowaveElectron mobilityDielectricMOSFETLeakage (economics)Gate oxideEquivalent oxide thicknessHigh-κ dielectricGate dielectricThermalElectronic engineeringAnalytical Chemistry (journal)TransistorElectrical engineeringComposite materialChemistryThermodynamicsPhysicsEngineeringChromatographyEconomicsMacroeconomicsQuantum mechanicsVoltageSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignThin-Film Transistor Technologies