Selenite‐Directed Organotin–Oxo Macrocycles for Nanolithography
Juan Wang, Ming‐Bu Luo, Zi‐Juan Wei, Er‐Xia Chen, Jin‐Xia Yang, Jian Zhang, Qipu Lin
Abstract
Abstract The systematic design of organotin–oxo macrocycles with enhanced extreme ultraviolet (EUV) photon‐harvesting capability and sub‐50 nm lithographic resolution remains a pivotal challenge in advancing nanofabrication technologies. Herein, we present a novel series of polynuclear n butyltin–oxygen macrocycles— Sn 8 , Sn 12 ‐α , Sn 12 ‐β , and Sn 12 Fe 18 —constructed through selenite ligand‐driven supramolecular assembly. Among these, Sn 12 ‐α demonstrated exceptional electron beam lithography (EBL) performance, achieving a critical dimension resolution of 50 nm at a low dose of 50 µC·cm −2 , attributed to its elevated Sn/Se content, compact molecular architecture (diameter, 1.5 nm), and excellent film‐forming ability (surface roughness, 0.59 nm). By replacing conventional carboxylate ligands with inorganic selenite, this study addresses longstanding limitations in structural versatility and EUV absorption efficiency inherent to traditional organotin–oxo systems. These findings establish a paradigm for engineering metal–oxide photoresists through ligand‐driven cluster dimensionality control, offering a scalable pathway to high‐sensitivity, high‐resolution patterning for next‐generation semiconductor manufacturing.