Improvement of Ferroelectricity and Reliability in Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Thin Films With Two-Step Oxygen Vacancy Engineering
Mingji Su, Shifan Gao, Zeping Weng, Zhao Liang, Choonghyun Lee, Yi Zhao
Abstract
A two-step oxygen vacancy (V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">O</sub> ) engineering technique is presented to enhance the ferroelectricity of Hf <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.5</sub> Zr <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.5</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> (HZO) film with superior dielectric reliability. The V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">O</sub> engineering consists of two steps: 1) V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">O</sub> formation in the HZO film to stabilize the orthorhombic phase and 2) V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">O</sub> passivation to annihilate the V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">O</sub> -related defects without degrading the ferroelectric properties. In addition, we further investigate the feasibility of the two-step V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">O</sub> engineering at a low thermal budget process (400 °C) for back-end-of-line (BEOL) applications. Superior remnant polarization (2P <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$_{\text {r}} = 43\,\,\mu \text{C}$ </tex-math></inline-formula> /cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> ) and high endurance of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$> 10^{{8}}$ </tex-math></inline-formula> cycles are demonstrated in HZO thin films processed at 400 °C, which are comparable to those processed at high temperatures.