An effective strategy for the preparation of intrinsic low-<i>k</i>and ultralow-loss dielectric polysiloxanes at high frequency by introducing trifluoromethyl groups into the polymers
Fengping Liu, Xingrong Chen, Linxuan Fang, Jing Sun, Qiang Fang
Abstract
Two new CF<sub>3</sub>-containing polysiloxanes with low dielectric constant (<italic>D</italic><sub>k</sub>) and dielectric loss (<italic>D</italic><sub>f</sub>) at a high frequency of 5 GHz were reported. The sample with two −CF<sub>3</sub>groups exhibits better dielectric properties with<italic>D</italic><sub>k</sub>of 2.53 and ultralow<italic>D</italic><sub>f</sub>of 1.66 × 10<sup>−3</sup>.
Topics & Concepts
DielectricDielectric lossPolymerMaterials scienceAnalytical Chemistry (journal)ChemistryCrystallographyOrganic chemistryOptoelectronicsSynthesis and properties of polymersSilicone and Siloxane ChemistrySynthesis and characterization of novel inorganic/organometallic compounds