Litcius/Paper detail

Annealing effects on a-SiC:H and a-SiCN:H films deposited by plasma CVD methods

S. Peter, Rico Ehrler, Thomas Seyller, Florian Speck

2020Vacuum10 citationsDOI

Topics & Concepts

Materials scienceNanoindentationElastic recoil detectionAnnealing (glass)Rutherford backscattering spectrometryComposite materialAnalytical Chemistry (journal)X-ray photoelectron spectroscopyAmorphous solidYoung's modulusSilicon carbideElastic modulusElectron cyclotron resonanceThin filmPlasmaCrystallographyChemistryNuclear magnetic resonanceNanotechnologyQuantum mechanicsPhysicsChromatographyThin-Film Transistor TechnologiesCopper Interconnects and ReliabilityZnO doping and properties
Annealing effects on a-SiC:H and a-SiCN:H films deposited by plasma CVD methods | Litcius