Low-temperature ALD/MLD growth of alucone and zincone thin films from non-pyrophoric precursors
Anish Philip, Lukas Mai, Ramin Ghiyasi, Anjana Devi, Maarit Karppinen
Abstract
Novel atomic/molecular layer (ALD/MLD) deposition process for alucone and zincone thin films based on non-pyrophoric precursors are reported.
Topics & Concepts
Atomic layer depositionThin filmDeposition (geology)Chemical engineeringLayer (electronics)Materials scienceNanotechnologyChemistryInorganic chemistryGeologyEngineeringSedimentPaleontologySemiconductor materials and devicesElectronic and Structural Properties of OxidesCatalytic Processes in Materials Science