The roles of the oxygen vacancies caused by the ion doping method in catalytic materials and their applications in advanced oxidation processes
Jinxin Nie, Cui Lai, Tianjue Hu, Huchuan Yan, Shiyu Liu, Ling Li, Xiuqin Huo, Xue‐Rong Zhou, Mingming Zhang, Fuhang Xu, Dengsheng Ma, Haoyang Ye, Yixia Li, Neng Wang, Hanxi Li
Abstract
We review the principles of oxygen vacancy formation induced by dopant ions, their mechanism of action and their application in advanced oxidation processes.
Topics & Concepts
ChemistryDopingCatalysisIonOxygenInorganic chemistryChemical engineeringNanotechnologyCombinatorial chemistryOrganic chemistryOptoelectronicsMaterials sciencePhysicsEngineeringCatalytic Processes in Materials ScienceCatalysis and Oxidation ReactionsElectronic and Structural Properties of Oxides