Lithography-free high sensitivity perfect absorption based on Graphene/α-MoO3/SiC and Tamm plasmonic structure
Zhenxing Li, Huiling Li, Zheng-Da Hu, Jiacheng Zhou, Jicheng Wang, Sergei Khakhomov
Topics & Concepts
Materials scienceCoupled mode theoryRefractive indexGrapheneAbsorption (acoustics)Transfer-matrix method (optics)LithographyOptoelectronicsPlasmonSensitivity (control systems)OpticsMetamaterialResonance (particle physics)NanotechnologyPhysicsElectronic engineeringQuantum mechanicsEngineeringComposite materialPlasmonic and Surface Plasmon ResearchPhotonic and Optical DevicesPhotonic Crystals and Applications