Litcius/Paper detail

Confined aluminum fluoride layers derived from the in situ etching of Ti3AlC2 as the robust catalyst for dehydrofluorination reaction

Wenfeng Han, Hong Yang, Linzhe Wang, Bing Liu, Xiaoli Wei, Aimin Chen, Weiyu Song, Haodong Tang, Ying Li

2020Applied Surface Science20 citationsDOI

Topics & Concepts

Sublimation (psychology)CatalysisFluorideIn situAluminiumEtching (microfabrication)Lewis acids and basesChemistryMaterials scienceInorganic chemistryChemical engineeringLayer (electronics)Organic chemistryEngineeringPsychologyPsychotherapistMXene and MAX Phase MaterialsInorganic Chemistry and MaterialsAmmonia Synthesis and Nitrogen Reduction
Confined aluminum fluoride layers derived from the in situ etching of Ti3AlC2 as the robust catalyst for dehydrofluorination reaction | Litcius