Effect of rotation of abrasives on material removal in chemical mechanical polishing using a proposed three-body model: Molecular dynamics simulation
Ruling Chen, Pengju Zhou, Hui Li
Topics & Concepts
AbrasiveMaterials sciencePolishingChemical-mechanical planarizationSubstrate (aquarium)Rotation (mathematics)Composite materialMolecular dynamicsRotational speedMechanical engineeringChemistryComputer scienceArtificial intelligenceGeologyEngineeringOceanographyComputational chemistryAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchForce Microscopy Techniques and Applications