Characterization and study of high conductivity antimony-doped tin oxide thin films grown by mist chemical vapor deposition
Li Liu, Mariko Ueda, Toshiyuki Kawaharamura
Abstract
ATO films are fabricated by mist CVD system. Supporting solutions including H 2 O, HNO 3 and HCl are used to improve film properties. Experimentally, ATO films with low resistivity of 6.58 × 10 −4 Ω cm, high transmittance of 90% are obtained successfully.
Topics & Concepts
X-ray photoelectron spectroscopyChemical vapor depositionAntimonyMaterials scienceThin filmAnalytical Chemistry (journal)ConductivityTin oxideTinElectrical resistivity and conductivityDopingChemical engineeringNanotechnologyChemistryOptoelectronicsMetallurgyPhysical chemistryChromatographyElectrical engineeringEngineeringZnO doping and propertiesGas Sensing Nanomaterials and SensorsGa2O3 and related materials