Ultra-thin top-gate insulator of atomic-layer-deposited HfOx for amorphous InGaZnO thin-film transistors
Yuhang Guan, Yuqing Zhang, Jinxiong Li, Jiye Li, Yuhan Zhang, Zhenhui Wang, Yuancan Ding, Mansun Chan, Xinwei Wang, Lei Lü, Shengdong Zhang, Xinwei Wang, Lei Lü, Shengdong Zhang
Topics & Concepts
Thin-film transistorMaterials scienceOptoelectronicsAmorphous solidTransistorAtomic layer depositionGate dielectricOxide thin-film transistorThin filmLayer (electronics)NanotechnologyElectrical engineeringCrystallographyChemistryEngineeringVoltageThin-Film Transistor TechnologiesSemiconductor materials and devicesSilicon and Solar Cell Technologies