Plasma-etched Ti<sub>2</sub>O<sub>3</sub>with oxygen vacancies for enhanced NH<sub>3</sub>electrosynthesis and Zn–N<sub>2</sub>batteries
Haijun Chen, Zhaoquan Xu, Shengjun Sun, Yongsong Luo, Qian Liu, Mohamed S. Hamdy, Zhe‐sheng Feng, Xuping Sun, Yan Wang
Abstract
Plasma-etched OV-Ti 2 O 3 behaves as an active and stable catalyst for electrochemical N 2 reduction to yield NH 3 , capable of attaining a large NH 3 yield of 37.24 μg h −1 mg cat. −1 and high faradaic efficiency of 19.29%.
Topics & Concepts
ElectrosynthesisYield (engineering)Faraday efficiencyCatalysisMaterials scienceElectrochemistryOxygenPlasmaInorganic chemistryOxygen reduction reactionChemistryElectrodeMetallurgyPhysical chemistryPhysicsBiochemistryOrganic chemistryQuantum mechanicsAmmonia Synthesis and Nitrogen ReductionAdvanced Photocatalysis TechniquesNanomaterials for catalytic reactions