Amorphous N-doped InSnZnO thin films deposited by RF sputtering for thin-film transistor application
Zhi-Yue Li, Shumei Song, Wanxia Wang, Mingjiang Dai, Songsheng Lin, Tingyong Chen, Hui Sun
Abstract
N-doped InSnZnO (ITZO:N) thin films as the active layer of thin film transistors (TFTs) were prepared using radio frequency (RF) magnetron sputtering at room temperature.
Topics & Concepts
Thin-film transistorMaterials scienceSputteringOptoelectronicsThin filmAmorphous solidDopingSputter depositionLayer (electronics)TransistorRadio frequencyElectrical engineeringNanotechnologyChemistryCrystallographyVoltageEngineeringThin-Film Transistor Technologies