Optical metasurfaces made by cell projection lithography
M. Hädrich, Thomas Siefke, Michael Banasch, Uwe D. Zeitner
Abstract
Abstract Metasurfaces offer promising possibilities for emerging photonic applications like see‐through, near‐eye displays. Vistec Electron Beam lithography systems with variable shaped beam (VSB) and cell projection (CP) technology provide a flexible solution to generate repetitive structures on large substrates. Excellent pattern fidelity is achieved in a feasible write‐time, enabling prototyping or the manufacturing of replication masters.
Topics & Concepts
LithographyElectron-beam lithographyProjection (relational algebra)Replication (statistics)Next-generation lithographyX-ray lithographyRapid prototypingMaskless lithographyFidelityPhotonicsMaterials scienceComputer scienceOpticsNanotechnologyOptoelectronicsResistPhysicsTelecommunicationsMathematicsComposite materialStatisticsLayer (electronics)AlgorithmMetamaterials and Metasurfaces ApplicationsAdvanced Antenna and Metasurface TechnologiesPlasmonic and Surface Plasmon Research