Pixelation of perovskite quantum wire thin films with 0.18-μm features and 63,500-ppi pixel density
Qianpeng Zhang, Xiaofei Sun, Guan-Yu Chen, Zichao Ma, Daquan Zhang, Yu Zhou, Xiao Qiu, Beitao Ren, Yucheng Ding, Swapnadeep Poddar, Wenying Tang, Hualiang Lv, Xiaoliang Mo, Zhiyong Fan
Abstract
Halide perovskite materials excel in broad optoelectronic applications, and there is an urgent demand to develop perovskite-based integrated optoelectronic devices. However, the limitations posed by the incompatibility of perovskite thin film with wet lithography greatly hinder its potential in many important applications, including ultrahigh-density displays, high-resolution image sensors, high-density memristors, and integrated photonic circuitry. To tackle this bottleneck problem, we develop the self-aligned close-spaced sublimation growth of perovskite quantum wires and demonstrate 0.18-micrometer feature size perovskite patterns, meanwhile achieving a pixel density of 63,500 pixels per inch, the highest reported for perovskite. We showcase pixelation of perovskite quantum wires with color conversion films, addressing the need for full-color microdisplays. In addition, we demonstrate these films on curved substrates, holding promise for near-eye microdisplays. Processes shown here can also apply to other perovskite devices such as high-resolution displays, image sensing, and memristor arrays.