Effects of growth temperature and reactor pressure on AlN thin film grown by metal-organic chemical vapor deposition
Binghui Lin, Yao Cai, Yaxin Wang, Yang Zou, Chao Gao, Yan Liu, Wenjuan Liu, Shishang Guo, Chengliang Sun
Topics & Concepts
Thin filmMaterials scienceMetalorganic vapour phase epitaxyChemical vapor depositionSapphireSurface roughnessSubstrate (aquarium)Deposition (geology)NitrideIsland growthAnalytical Chemistry (journal)Composite materialOptoelectronicsLayer (electronics)OpticsNanotechnologyChemistryEpitaxyLaserBiologyOceanographyGeologyPaleontologyChromatographySedimentPhysicsGaN-based semiconductor devices and materialsAcoustic Wave Resonator TechnologiesZnO doping and properties